Nanofabrication techniques in the field of electronic devices

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Career overview

Professor Alex Robinson qualified with a BSc (Hons) in Physics from the University of Birmingham in 1995. He obtained his PhD in 1999 for work on the development of materials for electron beam lithography, conducted at the Nanoscale Physics Research Laboratory of the University of Birmingham and the Joint Research Center for Atom Technology in Japan. Following his PhD, he investigated the modification of oxide surfaces using self-assembled monolayers in collaboration between the School of Chemistry at the University of Birmingham and BAe Systems. He then returned to the Nanoscale Physics Research Laboratory to continue his research in lithography and microfabrication. Professor Robinson has recently taken up a Senior Research Fellowship in the Science City Research Alliance, based in the School of Chemical Engineering and the School of Chemistry at the Universities of Birmingham and Warwick, respectively.

Research interests

Professor Robinson''s research focuses on the development of new materials and techniques for nanofabrication, particularly using electron beam lithography and next-generation techniques such as extreme ultraviolet lithography. His interests include the modification of oxide surfaces using self-assembled mono- and multilayers, coaxial field emission tips, and the properties of photoresists, including low energy electron beam resists and chemically amplified molecular resists for electron beam and EUV lithography. Currently, he is investigating the application of advanced materials in microfabrication and the integration of functional materials with patterned substrates. He is also interested in supervising doctoral research students in areas such as high-resolution lithography, guided self-assembly, and nanoscale plasma etching, as well as the application of these techniques in electronic devices, novel sensors, and patterned surfaces.