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Atomic Layer Deposition of Functional Thin Films

Project Description

An EPSRC DTP 4-year PhD studentship is available to investigate Atomic Layer Deposition (ALD) of functional thin films. ALD is a thin-film technique that owes much to Chemical Vapour Deposition (CVD), but provides for atomic level control of the growing film and therefore unique opportunities for depositing complex and layered thin-films. The advantages afforded by ALD include thickness control down to the atomic level, with good thickness uniformity over large areas and excellent adhesion to the substrate.

Hydrophobicity is a key surface property for a range of applications, where water adsorption can deteriorate the performance such as for protective coatings or gas diffusion barrier layers on polymer substrates. To alter a surface from hydrophilic to hydrophobic, typically requires the use of fluorinated polymers, which are harmful to the environment. The use of ALD to modify surfaces is underexplored but shows excellent potential for the tunability of hydrophilic/hydrophobic surfaces, which will be the focus of this project.

Application Details
Applicants should have (or expect to gain) at least a 2(i) MSci/MChem degree in Chemistry. Applicants should apply via UCL’s online application system Further information on the project can be obtained from Professor Claire j Carmalt ()

The deadline for applications is 30th April 2020, but the position will be filled as soon as an appropriate candidate is found.

Funding Notes

The successful candidate will receive a stipend (including London allowance) in addition to covering tuition fees. Due to restrictions on funding, this studentship is only open to UK and EU candidates who meet 3 year residency criteria.

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