Prof R Winpenny, Prof S Yeates, Dr D Lewis, Dr S Lewis
No more applications being accepted
Funded PhD Project (European/UK Students Only)
About the Project
Electron beam lithography (EBL) is one method for producing structures at the nanometre scale for use in electronics and other advanced technologies. We want to use EBL in a more exciting way – to decompose metal-organic precursors directly in the electron beam to make nanostructures of useful materials which could include semiconductors such as CdS, metals such as Pd or Cu, insulators such as ZnO or Al2O3 and even high T superconductors. The project would involve synthesis of suitable metal-organic precursors and then study of film formation and decomposition behaviour of the precursor. Once nanostructures are written we would use the contacts within Heteroprint to see if we could then print such structures. The project would offer training in a wide range of skills and techniques and involve collaboration with other leading UK groups.
Applicants are expected to hold, or about to obtain, a first class or 2:i degree (or equivalent) in Chemistry or an appropriate related discipline.
Contact for further Information:
Professor Winpenny
[Email Address Removed]
Funding Notes
This is a 3.5 year funded studentship covering fees and stipend(£15,009 p.a. in 2019/20).
Open to UK/EU nationals only. Please note, EU students need to have 3 years residency in the UK to be eligible, due to funding restrictions.
We expect the programme to start in September 2020.
References
• S. M. Lewis, M. S. Hunt, G. A. DeRose, H. R. Alty, J. Li, A. Wertheim, L. De Rose, G. A. Timco, A. Scherer, S. G. Yeates and R. E. P. Winpenny, “Plasma-etched pattern transfer of sub-10 nm structures using a metal-organic resist and helium ion beam lithography”, Nano Lett., 2019, 19, 6043-6048.
• S. M. Lewis, A. Fernandez, G. A. DeRose, M. S. Hunt, G. F. S. Whitehead, A. Lagzda, H. R. Alty, J. Ferrando-Soria, S. Varey, A. K. Kostopoulos, F. Schedin, C. A. Muryn, G. A. Timco, A. Scherer, S. G. Yeates and R. E. P. Winpenny, “Use of Supramolecular Assemblies as Lithographic Resists”. Angew. Chem. Int. Ed. 2017, 56, 6749-6751.
Continue with Facebook
