About the Project
This research project will be focused on the preparation of group 15 Zintl clusters (polyatomic clusters of the p-block) functionalized with heavy group 14 elements (e.g. Si, Ge, Sn) to be cast into thin films and investigated in pattern fabrication using electron-beam lithography (EBL) and extreme ultraviolet (EUV) lithography. Incorporation of heavy group 14 and 15 elements into resists using these clusters is expected to drastically increase their write speed and thus their performance. This work lies at the interface of synthetic main group chemistry and the nanofabrication of electronic devices.
The successful applicant will receive excellent training in the principles of solution phase coordination chemistry and synthetic solid-state techniques, specifically as applied to air-sensitive materials. On the materials side training in techniques for nanofabrication, including EBL. Training in characterisation tools such as X-ray crystallography, NMR spectroscopy and mass spectrometry will also be provided.
Academic background of candidates
Applicants are expected to hold, or about to obtain, a minimum upper second-class undergraduate degree (or equivalent) in Chemistry. Applicants should have a keen interest in synthetic inorganic chemistry and materials science.
Contact for further Information
Richard Winpenny: [Email Address Removed];
Meera Mehta: [Email Address Removed]
We expect the programme to commence in September 2021.
transfer of sub-10 nm structures using a metal-organic resist and helium ion beam lithography”, Nano Lett., 2019, 19, 6043-6048.
• S. M. Lewis, A. Fernandez, G. A. DeRose, M. S. Hunt, G. F. S. Whitehead, A. Lagzda, H. R. Alty, J. Ferrando-Soria, S. Varey, A. K. Kostopoulos, F. Schedin, C. A. Muryn,
G. A. Timco, A. Scherer, S. G. Yeates and R. E. P. Winpenny, “Use of Supramolecular Assemblies as Lithographic Resists”. Angew. Chem. Int. Ed. 2017, 56, 6749-6751.
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