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Zintl Ions as Components of High-Speed Extreme UV Resists

   Department of Chemistry

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  Prof R Winpenny, Dr M Mehta  No more applications being accepted  Competition Funded PhD Project (UK Students Only)

About the Project

This research project will be focused on the preparation of group 15 Zintl clusters (polyatomic clusters of the p-block) functionalized with heavy group 14 elements (e.g. Si, Ge, Sn) to be cast into thin films and investigated in pattern fabrication using electron-beam lithography (EBL) and extreme ultraviolet (EUV) lithography. Incorporation of heavy group 14 and 15 elements into resists using these clusters is expected to drastically increase their write speed and thus their performance. This work lies at the interface of synthetic main group chemistry and the nanofabrication of electronic devices.

 The successful applicant will receive excellent training in the principles of solution phase coordination chemistry and synthetic solid-state techniques, specifically as applied to air-sensitive materials. On the materials side training in techniques for nanofabrication, including EBL. Training in characterisation tools such as X-ray crystallography, NMR spectroscopy and mass spectrometry will also be provided.

We are committed to promoting diversity and inclusiveness within our research groups. We strongly encourage applications from talented individuals of all racial, cultural, and socioeconomic backgrounds, sexual orientations, gender identities, and disabilities.

Applicants are expected to hold, or about to obtain, a minimum upper second-class undergraduate degree (or equivalent) in Chemistry. Applicants should have a keen interest in synthetic inorganic chemistry and materials science.

Equality, diversity and inclusion is fundamental to the success of The University of Manchester, and is at the heart of all of our activities. We know that diversity strengthens our research community, leading to enhanced research creativity, productivity and quality, and societal and economic impact. We actively encourage applicants from diverse career paths and backgrounds and from all sections of the community, regardless of age, disability, ethnicity, gender, gender expression, sexual orientation and transgender status.

We also support applications from those returning from a career break or other roles. We consider offering flexible study arrangements (including part-time: 50%, 60% or 80%, depending on the project/funder). 

Funding Notes

Fees and stipend provided at current UKRI rate


S. M. Lewis, M. S. Hunt, G. A. DeRose, H. R. Alty, J. Li, A. Wertheim, L. De Rose, G. A. Timco, A. Scherer, S. G. Yeates and R. E. P. Winpenny, “Plasma-etched pattern transfer of sub-10 nm structures using a metal-organic resist and helium ion beam lithography”, Nano Lett., 2019, 19, 6043-6048.
S. M. Lewis, A. Fernandez, G. A. DeRose, M. S. Hunt, G. F. S. Whitehead, A. Lagzda, H. R. Alty, J. Ferrando-Soria, S. Varey, A. K. Kostopoulos, F. Schedin, C. A. Muryn, G. A. Timco, A. Scherer, S. G. Yeates and R. E. P. Winpenny, “Use of Supramolecular Assemblies as Lithographic Resists”. Angew. Chem. Int. Ed. 2017, 56, 6749-6751.

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