Novel Spectroscopic Techniques for Characterization of Silicon Surfaces

4 years postgraduate research position in the field of novel analytical technologies and nanoprocesses in advanced semiconductor manufacturing at School of Chemistry University College Dublin in collaboration with Intel Ireland.
The project belongs to the interdisciplinary area of nanotechnology, surface chemistry and non-destructive analytical methods, and is focused on application of ultrasonic spectroscopic technology for real-time characterization of the state of silicon surfaces utilized in semiconductor manufacturing. The ultrasonic spectroscopy will be accompanied by other methods for surface analysis including, Ellipsometry, X-Ray Photoelectron Spectroscopy (XPS), Surface Tension Techniques, Atomic Force Microscopy.
The fellowship is within the framework of Irish Research Council Enterprise Partnership Scheme 2020. Successful applicant will benefit from the opportunity to gain valuable research experience and insight into the commercial/organisational arena while completing the scholarship (see http://research.ie/funding/eps-postgrad/?f=postgraduate for 2019).
Candidates should have EU citizenship, first or upper second-class degree or relevant MSc in chemistry, chemical engineering, physics or other relevant subjects.
Applications shall include: (1) cover letter, (2) CV with photograph, (3) names and contact details of two referees, (4) details of graduate qualifications.
Applications shall be sent to Prof Vitaly Buckin: [Email Address Removed].
The subject line shall be: Intel PHD fellowship, ‘name of the applicant’ (example: Intel PHD fellowship, John Smith).