The CVD Research group has an established reputation as a leading research group in innovative coating technologies, with close links to industry. The project, within this group, will involve the deposition of functional thin films via atmospheric pressure chemical vapour deposition (APCVD). The deposited oxide films, including SnO2, SiO2 and TiO2 all have strongly directed application within the PV industry. Analysis will be available from a wide range of thin film analysis techniques for morphological (TEM, SEM, AFM, XRD), optical spectroscopies, chemical composition (XPS, GDOES) and electrical. The study will involve systematically modifying deposition parameters and CVD coating technology to assess trends in film properties and optimum PV behaviour.
Candidates should have a first or upper second class honours degree in an area relevant to the subject. Candidates should have an interest in thin films deposition and materials characterisation. In all cases a Master’s degree or equivalent qualification or other evidence of research skills and experience is preferred but not essential.